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Sym3 Y tailored to critical conductor etch applications in 3D NAND, DRAM and foundry-logic nodes.
August 11, 2020
By: DAVID SAVASTANO
Editor, Ink World Magazine
Applied Materials, Inc. announced a new addition to its successful Centris Sym3 etch product family, that now enables chipmakers to precisely pattern and shape ever-smaller features in leading-edge memory and logic chips. The new Centris Sym3® Y is Applied’s most advanced conductor etch system. It uses RF pulsing technology to provide the extremely high materials selectivity, depth control and profile control needed by customers to create densely packed, high-aspect-ratio structures in 3D NAND...
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